Oxygen-free copper with grain growth suppression
MOFC™-GC
C10810
- Thermal management
Oxygen-free copper with grain growth suppression
C10810
Insulation substrate (AMB substrate)
MOFC-GC is an oxygen-free copper with world-class crystal grain growth inhibition performance, contributing to improved quality and enhanced process stability in a wide range of electronic components and power modules.
While maintaining electrical and thermal conductivity comparable to conventional oxygen-free copper (C10200), MOFC-GC suppresses crystal grain growth at elevated temperatures and achieves a fine and uniform crystal structure even after high-temperature processing.

The following benefits can be expected from using MOFC-GC as the material for ceramic substrates such as AMB substrates.
(Weight %)
| Cu |
|---|
| 99.95% Min. |
(Weight %)
| Property | Representative Value |
|---|---|
| Specific Gravity | 8.94 |
| Coefficient of Thermal Expansion ×10-6/K(293~573℃) |
17.6 |
| Thermal Conductivity (W/(m・K):293K) |
391 |
| Volume Resistivity (μΩm:293K) |
0.017 |
| Electrical Conductivity (%IACS:293K) |
101 |
| Modulus of Elasticity kN/mm² |
119 |
| Poisson’s Ratio (293K) |
0.30 |
| Temper | Typical Values | |
|---|---|---|
| 1/4H | 1/4H t:0.8mm |
|
| Tensile Strength (N/mm²) |
215-275 | 245 |
| Elongation (%) |
25 Min. | 36 |
| Vickers Hardness (HV) |
- | 71 |
It has been confirmed that MOFC-GC suppresses crystal grain growth even during heat treatment at 1000℃. With its superior crystal grain growth inhibition performance, MOFC-GC maintains a fine and uniform crystal structure even after AMB (Active Metal Bonding).
Grain size after heat treatment in air atmosphere
Heating
rate: 10℃/min
Hold time: 1h



Microstructure after heat
treatment in air atmosphere
Heating rate: 10℃/min
Hold time: 1h


Microstructure of our company prototype AMB substrate